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1

Control of relative etch rates of SiO2 and Si in plasma etching

Rudolf A.H. Heinecke

Journal:

Solid-State Electronics

Year:

1975

Language:

english

File:

PDF, 148 KB

english, 1975

2

Plasma reactor design for the selective etching of SiO2 on Si

Rudolf A.H. Heinecke

Journal:

Solid-State Electronics

Year:

1976

Language:

english

File:

PDF, 209 KB

english, 1976

3

TfI8: Pulsed plasma deposition of lead lanthanum zirconate titanate(PLZT) and lead lanthanum titanate(PLT)

Llewellyn, Ian P., Heinecke, Rudolf A., Lewis, Keith L., Dexter, Kathleen F.

Journal:

Year:

1992

Language:

english

File:

PDF, 463 KB

english, 1992

4

SPIE Proceedings [SPIE Laser-Induced Damage in Optical Materials: 1993 - Boulder, CO (Wednesday 27 October 1993)] Laser-Induced Damage in Optical Materials: 1993 - 1.064-μm laser damage studies of silicon oxy-nitride narrow band reflectors

Milward, Jonathan R., Lewis, Keith L., Sheach, K., Heinecke, Rudolf A., Bennett, Harold E., Chase, Lloyd L., Guenther, Arthur H., Newnam, Brian E., Soileau, M. J.

Year:

1994

Language:

english

File:

PDF, 201 KB

english, 1994

5

SPIE Proceedings [SPIE Optical Materials for High Power Lasers - Boulder, CO (Monday 28 September 1992)] 24th Annual Boulder Damage Symposium Proceedings -- Laser-Induced Damage in Optical Materials: 1992 - Laser damage studies of silicon oxy-nitride narrowband reflectors

Milward, Jonathan R., Lewis, Keith L., Sheach, K., Heinecke, Rudolf A., Bennett, Harold E., Chase, Lloyd L., Guenther, Arthur H., Newnam, Brian E., Soileau, M. J.

Year:

1993

Language:

english

File:

PDF, 397 KB

english, 1993

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